Shimane Univ. Fujita-Yoshida Lab.
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Toshiyuki Yoshida丂丂Shimane University, Natural Science and Technology, Associate Professor
Topics of research:
The particle process using semiconductor fine particles has merits such as cost reduction, versatility of substrate, and large area. In particular, oxide materials such as zinc oxide (ZnO) are easy to handle in the atmosphere and various solvents and have a wide range of applications. Our laboratory is conducting research with the aim of forming such fine particle layers of oxide semiconductors and applying them to transistor channels. Since a layer that functions as a semiconductor can be obtained simply by applying fine particles, it will be possible to manufacture integrated circuits (ICs) and displays even in places where electronic circuits could not be manufactured in the past.
丒 Formation of layer by application of ZnO fine particle dispersion
丒 Doping technology for ZnO fine particles
Business career:
1998乣1999
Kitami Institute of Engineering, Part-time Lecturer
2000乣2001
Japan Society for the Promotion of Science, Research Fellow
2001乣2018
Shimane University, Assistant Professor
2019乣
Shimane University, Associate Professor
Contact address
1060 Nishikawatsu, Matsue, Shimane, Japan, 690-8504
Shimane University
Professor: Yasuhisa Fujita
TEL/FAX: (0852)32-6257
E-mail: fujita@riko.shimane-u.ac.jp
Associate Professor: Toshiyuki Yoshida
TEL/FAX: (0852)32-6346
E-mail: yosisi@riko.shimane-u.ac.jp