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Shimane Univ. Fujita-Yoshida Lab.

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Toshiyuki Yoshida丂丂Shimane University, Natural Science and Technology, Associate Professor

 

Achievements

 

Topics of research:

The particle process using semiconductor fine particles has merits such as cost reduction, versatility of substrate, and large area. In particular, oxide materials such as zinc oxide (ZnO) are easy to handle in the atmosphere and various solvents and have a wide range of applications. Our laboratory is conducting research with the aim of forming such fine particle layers of oxide semiconductors and applying them to transistor channels. Since a layer that functions as a semiconductor can be obtained simply by applying fine particles, it will be possible to manufacture integrated circuits (ICs) and displays even in places where electronic circuits could not be manufactured in the past.

Formation of layer by application of ZnO fine particle dispersion

Doping technology for ZnO fine particles

 

Business career:

19981999

Kitami Institute of Engineering,   Part-time Lecturer

20002001

Japan Society for the Promotion of Science,   Research Fellow

20012018

Shimane University,   Assistant Professor

2019

Shimane University,   Associate Professor

 

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Contact address

1060 Nishikawatsu, Matsue, Shimane, Japan, 690-8504

Shimane University

Professor: Yasuhisa Fujita

TEL/FAX: (0852)32-6257

E-mail: fujita@riko.shimane-u.ac.jp

 

  Associate Professor: Toshiyuki Yoshida

  TEL/FAX: (0852)32-6346

E-mail: yosisi@riko.shimane-u.ac.jp